Investigation of the Amorphous to Nanocrystalline Phase Transition at the Deposition of Silicon Films in an ECWR Plasma of Pure SiH4
- 1 January 1996
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Complete microcrystalline p-i-n solar cell—Crystalline or amorphous cell behavior?Applied Physics Letters, 1994
- Use of electric probes in silane radio frequency dischargesJournal of Applied Physics, 1983
- Dissociation cross sections of silane and disilane by electron impactChemical Physics, 1982
- Origin of emitting species in the plasma deposition of a-Si:H alloysJournal of Applied Physics, 1981
- Sputtered neutral mass spectrometry (SNMS) as a tool for chemical surface analysis and depth profilingApplied Physics B Laser and Optics, 1977
- Electron cyclotron wave resonances and power absorption effects in electrodeless low pressure h.f. plasmas with a superimposed static magnetic fieldPlasma Physics, 1974
- Skin Effect in Anisotropic Plasmas and Resonance Excitation of Electron-Cyclotron Waves. I. TheoryJournal of Applied Physics, 1966