Deposition of hard coatings by a hollow-cathode arc evaporation device
- 1 July 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 140, 666-669
- https://doi.org/10.1016/0921-5093(91)90493-7
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Plasma Diagnostics in a Hollow Cathode arc Evaporation System During TinX‐DepositionContributions to Plasma Physics, 1990
- Reactive sputtering characteristics of silicon in an ArN2 mixtureThin Solid Films, 1986