Depth of origin of sputtered atoms
- 1 July 1981
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 25 (3) , 307-310
- https://doi.org/10.1007/bf00902988
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Recoil implantation and ion-beam-induced composition changes in alloys and compoundsJournal of Applied Physics, 1979
- A theoretical treatment of cascade mixing in depth profiling by sputteringPhysics Letters A, 1979
- sputtering processes: collision cascades and spikesPublished by Elsevier ,1977
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- ON THE NUMBER OF ATOMS DISPLACED BY IMPLANTED IONS OR ENERGETIC RECOIL ATOMSApplied Physics Letters, 1969
- II. The energy spectrum of ejected atoms during the high energy sputtering of goldPhilosophical Magazine, 1968