Ion sputtering of microparticles in SIMS depth profile analysis
- 1 August 2001
- Vol. 63 (4) , 685-689
- https://doi.org/10.1016/s0042-207x(01)00258-5
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Surface roughening at the ZnTe/GaAs interface in stationary and sample rotation SIMS depth profilingVacuum, 1996
- Surface and depth analysis of pollen treated with atmospheric trace gasesJournal of Aerosol Science, 1996
- Ultrahigh vacuum manipulator for sample rotation in secondary ion mass spectrometry depth profile analysisReview of Scientific Instruments, 1995
- Secondary neutral mass spectrometry as a new tool fordepth resolved analysis of particulate matterJournal of Aerosol Science, 1991
- High resolution secondary ion mass spectrometry depth profiling using continuous sample rotation and its application to superlattice and delta-doped sample analysisJournal of Vacuum Science & Technology A, 1990
- Quantitative analysis by submicron secondary ion mass spectrometryJournal of Vacuum Science & Technology B, 1988
- The theory of surface erosion by ion bombardmentProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1986
- Improved depth resolution by sample rotation during Auger electron spectroscopy depth profilingThin Solid Films, 1985
- On the problem of the stability of pyramidal structures on bombarded copper surfacesRadiation Effects, 1979
- Sputtering by Ion BombardmentPublished by Elsevier ,1955