Optimisation of low-temperature silicon epitaxy on seeded glass substrates by ion-assisted deposition
- 1 July 2005
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 280 (3-4) , 385-400
- https://doi.org/10.1016/j.jcrysgro.2005.04.011
Abstract
No abstract availableKeywords
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