Model of the dissolution of monomolecular photoresists
- 1 October 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 85 (1) , 77-85
- https://doi.org/10.1016/0040-6090(81)90057-2
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Recent improvements in monomolecular resistsThin Solid Films, 1980
- Polymerized monomolecular layers: A new class of ultrathin resins for microlithographyThin Solid Films, 1980
- Computer simulation of exposure and development of a positive photoresistJournal of Applied Physics, 1979
- Model for the Kinematics of Polymer DissolutionIBM Journal of Research and Development, 1977
- Developer Characteristics of Poly‐(Methyl Methacrylate) Electron ResistJournal of the Electrochemical Society, 1975
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975