The preparation of tantalum nitride targets by reactive sputtering
- 1 March 1973
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 107 (2) , 233-235
- https://doi.org/10.1016/0029-554x(73)90235-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- N15(He3,d)O16Reaction and Structure of Oxygen-16Physical Review B, 1969
- Preparation, Structure, and Properties of Sputtered, Highly Nitrided Tantalum FilmsJournal of Applied Physics, 1968
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964
- Interface Formation during Thin Film DepositionJournal of Applied Physics, 1963