Rutherford backscattering investigation of thermally oxidized tantalum on silicon
- 1 April 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 33 (3) , 315-322
- https://doi.org/10.1016/0040-6090(76)90101-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Oxidation of tantalum film on siliconThin Solid Films, 1974
- Principles and applications of ion beam techniques for the analysis of solids and thin filmsThin Solid Films, 1973
- Structure and Composition of Sputtered Tantalum Thin Films on Silicon Studied by Nuclear and X-Ray AnalysisJournal of Applied Physics, 1972