Oxidation of tantalum film on silicon
- 1 October 1974
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 23 (3) , S63-S66
- https://doi.org/10.1016/0040-6090(74)90024-8
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- uv-stimulated photocurrent spectroscopy and trapping kinetics of a 2.1-eV trap in anodic Ta2O5 filmsJournal of Applied Physics, 1974
- Analysis of thin-film structures with nuclear backscattering and x-ray diffractionJournal of Vacuum Science and Technology, 1974
- Defect Structure and Irradiation Behavior of Noncrystalline SiO2IEEE Transactions on Nuclear Science, 1971
- LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUMApplied Physics Letters, 1971
- Thin Tunnelable Layers of Silicon Dioxide Formed by Oxidation of SiliconJournal of the Electrochemical Society, 1970
- Ellipsometer Study of Anodic Oxides Formed on Sputtered Tantalum and Tantalum–Aluminum Alloy FilmsJournal of Vacuum Science and Technology, 1969
- Thin film dielectric materials for microelectronicsProceedings of the IEEE, 1969