Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering
- 11 July 2003
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 440 (1-2) , 66-73
- https://doi.org/10.1016/s0040-6090(03)00832-0
Abstract
No abstract availableKeywords
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