Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique
- 1 July 2001
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 142-144, 615-620
- https://doi.org/10.1016/s0257-8972(01)01149-5
Abstract
No abstract availableKeywords
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