A wafer charge-up-reducing system of a high-current ion implanter
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 605-608
- https://doi.org/10.1016/0168-583x(89)90257-7
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- A new computer designed faraday system for high current ion implantation systemsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Charging studies in applied materials precision implant 9000 systemNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Wafer charging and beam interactions in ion implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Theoretical and experimental study of space charge in intense ion beamsPhysical Review A, 1979