Determination of the barrier-height fluctuations based on the parallel-noninteracting diode model
- 20 May 2002
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 80 (20) , 3751-3753
- https://doi.org/10.1063/1.1480882
Abstract
A model is proposed to determine the barrier height fluctuations of the inhomogeneous Schottky junction from the experimental current–voltage (I–V) characteristics. This model is based on noninteracting parallel diodes. In it, the current of each diode responds to a general expression of the thermionic theory where the Schottky effect and the series resistance are enclosed. The barrier height fluctuations are an effective-area barrier-height distribution which is defined as the probability of occurrence of the barrier height for each diode. The model is applied to the experimental I–V curves reported by I. M. Dharmadasa et al., Solid-State Electronics 42, 595 (1998).Keywords
This publication has 14 references indexed in Scilit:
- Metal/n-CdTe interfaces: A study of electrical contacts by deep level transient spectroscopy and ballistic electron emission microscopySolid-State Electronics, 1998
- Effects of barrier height distribution on the behavior of a Schottky diodeJournal of Applied Physics, 1997
- Ballistic-Electron-Emission Microscopy: A Nanometer-Scale Probe of Interfaces and Carrier TransportAnnual Review of Materials Science, 1996
- On the existence of a distribution of barrier heights in Pd2Si/Si Schottky diodesJournal of Applied Physics, 1996
- Correlation between barrier height and interface structure of Schottky diodesSurface Science, 1995
- Fluctuations of the Au-Si(100) Schottky barrier heightPhysical Review Letters, 1993
- Electron transport of inhomogeneous Schottky barriers: A numerical studyJournal of Applied Physics, 1991
- Electron transport of inhomogeneous Schottky barriersApplied Physics Letters, 1991
- Observation of Interface Band Structure by Ballistic-Electron-Emission MicroscopyPhysical Review Letters, 1988
- Parallel silicide contactsJournal of Applied Physics, 1980