The phase composition of SiOx films
- 7 May 1982
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 91 (1) , L55-L57
- https://doi.org/10.1016/0040-6090(82)90127-4
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Observation of amorphous silicon regions in silicon-rich silicon dioxide filmsApplied Physics Letters, 1980
- Variation of semiconductor properties through the SiOx region of Si SiO2 interfacesJournal of Non-Crystalline Solids, 1980
- Electron spin resonance and hopping conductivity of a-SiOxJournal of Non-Crystalline Solids, 1979
- Crystallographic study of semi-insulating polycrystalline silicon (SIPOS) doped with oxygen atomsJournal of Applied Physics, 1978
- Observation and analysis of the primary 29Si hyperfine structure of the E′ center in non-crystalline SiO2Solid State Communications, 1974
- Electron Spin Resonance in Amorphous Silicon, Germanium, and Silicon CarbidePhysical Review Letters, 1969