SiH bonding configuration in SiOx: N,H films deposited by chemical vapor deposition
- 31 December 1996
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 100 (9) , 657-661
- https://doi.org/10.1016/0038-1098(96)00482-6
Abstract
No abstract availableKeywords
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