The structure and composition of TiZrN, TiAlZrN and TiAlVN coatings
- 1 December 1988
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 105-106, 481-488
- https://doi.org/10.1016/0025-5416(88)90732-x
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminumJournal of Vacuum Science & Technology A, 1987
- Titanium aluminum nitride films: A new alternative to TiN coatingsJournal of Vacuum Science & Technology A, 1986
- On structure and properties of sputtered Ti and Al based hard compound filmsJournal of Vacuum Science & Technology A, 1986
- Structures and resistive properties of sputtered TiZrAlN thin filmsThin Solid Films, 1972
- Phase Relationships in the Binary Systems of Nitrides and Carbides of Zirconium, Columbium, Titanium, and VanadiumJournal of the Electrochemical Society, 1950