Modeling of InGaN MOVPE in AIX 200 Reactor and AIX 2000 HT Planetary Reactor
Open Access
- 1 January 1999
- journal article
- Published by Springer Nature in MRS Internet Journal of Nitride Semiconductor Research
- Vol. 4 (1)
- https://doi.org/10.1557/s1092578300000612
Abstract
Multiwafer Planetary Reactor is a promising system for large-scale production of heterostructures for LED's based on III-group nitrides. Analysis of chemical processes occurring in the reactor allows one to get insight into specific mechanisms governing growth of nitride based heterostructures. In the present paper results of modeling analysis of MOVPE of InxGa1−xN layers in AIX-200 Reactor and AIX 2000 HT Planetary Reactor are reported. The model used for MOVPE process analysis accounts for gas flow, heat transfer, and multicomponent mass transport along with gas phase and surface chemical reactions. Results of the modeling analysis of In transport and incorporation into the solid phase are compared with experimental data. It is shown that the model predicts reasonably well the In incorporation during MOVPE of InGaN under In/(In+Ga) ratio in the gas phase less than 20%.Keywords
This publication has 16 references indexed in Scilit:
- Suppression of phase separation in InGaN due to elastic strainMRS Internet Journal of Nitride Semiconductor Research, 1998
- GaInN/GaN-Heterostructures and Quantum Wells Grown by Metalorganic Vapor-Phase EpitaxyMRS Internet Journal of Nitride Semiconductor Research, 1997
- High Quality Al-Ga-In-N Heterostructures Fabricated by MOVPE Growth in Multiwafer ReactorsMRS Internet Journal of Nitride Semiconductor Research, 1997
- Multiwafer Movpe of III-Nitride Films for Led and Laser ApplicationsMRS Proceedings, 1997
- A study of parasitic reactions between NH3 and TMGa or TMAIJournal of Electronic Materials, 1996
- MOCVD Equipment for Recent Developments towards the Blue and Green Solid State LaserMRS Internet Journal of Nitride Semiconductor Research, 1996
- Metalorganic vapor phase epitaxy growth of (InxGa1-xN/GaN)n layered structures and reduction of indium dropletsJournal of Crystal Growth, 1994
- Wide-gap semiconductor InGaN and InGaAln grown by MOVPEJournal of Electronic Materials, 1992
- Pyrolysis of triethylgallium by the toluene carrier techniqueCanadian Journal of Chemistry, 1979
- THE PYROLYSIS OF TRIMETHYLINDIUMCanadian Journal of Chemistry, 1964