Characterization of pyrolytic boron nitride as a diffusion source for silicon
- 31 July 1978
- journal article
- research article
- Published by Elsevier in Solid-State Electronics
- Vol. 21 (7) , 987-988
- https://doi.org/10.1016/0038-1101(78)90299-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Anomalous Boron Diffusion in Silicon from Planar Boron Nitride SourcesJournal of the Electrochemical Society, 1974
- Oxidized Boron Nitride Wafers as an In-Situ Boron Dopant for Silicon DiffusionsJournal of the Electrochemical Society, 1973
- Identification of Chemical Constituents of Defects in SiliconJournal of the Electrochemical Society, 1972