Chemical vapour deposition of Al2O3 on TiO

This publication has 25 references indexed in Scilit:

• Space-group determination and structure model for κ-Al₂O₃ by convergent-beam electron diffraction (CBED)
  Acta crystallographica Section B, Structural science, crystal engineering and materials, 1991
• Characterization of α-Al2O3, κ-Al2O3, and α-κ multioxide coatings on cemented carbides
  Thin Solid Films, 1990
• Protectiveness of CVD Al2O3 Films on TiN against High-Temperature Oxidation
  Materials Transactions, JIM, 1990
• Nucleation and growth of aluminium oxide on silicon in the CVD process
  Journal of Materials Science, 1987
• Preparation of alumina coatings by chemical vapour deposition
  Thin Solid Films, 1986
• Chemical vapour deposition of alumina on cutting tool inserts from AlCl3-H2-CO2 mixtures: Influence of the chemical vapour deposition parameters and the nature of the inserts on the morphology and wear resistance of the coatings
  Wear, 1982
• Properties of Al2 O 3 Films Deposited from the AlCl3, CO 2, and H 2 System
  Journal of the Electrochemical Society, 1978
• Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl₃-CO₂-H₂System
  Japanese Journal of Applied Physics, 1972
• INFLUENCE OF DEPOSITION TEMPERATURE ON PROPERTIES OF HYDROLYTICALLY GROWN ALUMINUM OXIDE FILMS
  Applied Physics Letters, 1971
• Plastic deformation of single crystals of sapphire: Basal slip and twinning
  Acta Metallurgica, 1957