Hillock recognition by digital image processing
- 1 October 1995
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 91 (1-4) , 246-250
- https://doi.org/10.1016/0169-4332(95)00126-3
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- The effect of grain orientation on the relaxation of thermomechanical stress and hillock growth in AI-1%Si conductor layers on silicon substratesJournal of Electronic Materials, 1993
- A transmission electron microscopy study of hillocks in thin aluminum filmsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Metallurgical topics in silicon device interconnections: Thin film stressesInternational Materials Reviews, 1989