Indice de réfraction du silicium amorphe hydrogéné préparé par glow discharge entre 95 et 723 K
- 1 December 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 86 (4) , 337-345
- https://doi.org/10.1016/0040-6090(81)90341-2
Abstract
No abstract availableKeywords
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