Characterization of Titanium Oxide Films Prepared by Liquid Phase Deposition Using Hexafluorotitanic Acid
- 1 February 2000
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 39 (2A) , L101
- https://doi.org/10.1143/jjap.39.l101
Abstract
Using a mixture of hexafluorotitanic acid, boric acid and silicon substrate, high-refractive-index titanium oxide films can be deposited on silicon substrates; this results in a featureless surface. The Ti–O, Si–O and Si–O–Ti bonds were observed by Fourier transform infrared spectroscopy, indicating that the film is a combination of SiO2 and TiO2. The leakage current density and dielectric constant of the deposited films were examined in this paper.Keywords
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