Abstract
Using a mixture of hexafluorotitanic acid, boric acid and silicon substrate, high-refractive-index titanium oxide films can be deposited on silicon substrates; this results in a featureless surface. The Ti–O, Si–O and Si–O–Ti bonds were observed by Fourier transform infrared spectroscopy, indicating that the film is a combination of SiO2 and TiO2. The leakage current density and dielectric constant of the deposited films were examined in this paper.