In-situ IR and spectroscopic ellipsometric analysis of growth process and structural properties of Ti1−xNbxO2 thin films by metal-organic chemical vapor deposition
- 28 December 1999
- journal article
- Published by Elsevier
- Vol. 346 (1-2) , 73-81
- https://doi.org/10.1016/s0040-6090(98)01431-x
Abstract
No abstract availableKeywords
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