Nitrogen Profiles of Ion-Implanted TiN Films by Electron Energy Loss Spectroscopy
- 16 July 1986
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 96 (1) , 89-99
- https://doi.org/10.1002/pssa.2210960111
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structureThin Solid Films, 1983
- Properties of TiN obtained by N+2 implantation on Ti-coated Si wafersApplied Physics Letters, 1982
- A simple electron spectrometer for energy analysis in the transmission microscopeUltramicroscopy, 1978
- Structure and Electrical Properties of Titanium Nitride FilmsJapanese Journal of Applied Physics, 1978