Ion-implanted TiN films as diffusion barriers in silicon device technology
- 1 July 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 129 (1-2) , 55-61
- https://doi.org/10.1016/0040-6090(85)90094-x
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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