Silicon nitride as an effective protection against oxidation of a TiNi thin film in high temperature oxidizing air environment at atmospheric pressure
- 1 January 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 19 (1) , 305-307
- https://doi.org/10.1116/1.1338552
Abstract
No abstract availableKeywords
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