Laser chemical vapor deposition of selected area Fe and W films
- 1 March 1983
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 54 (3) , 1641-1643
- https://doi.org/10.1063/1.332154
Abstract
Localized deposition of thin films of W and Fe in both spot and line geometries has been demonstrated by laser chemical vapor deposition using a CO2 laser and several different gaseous reactants. Although optical self-limiting of the deposit thickness was observed under some irradiation conditions, films several thousand Å thick could be deposited with good physical properties. Radial dimensions were less than or equal to the laser beam diameter (D1/e2 =600 μm).This publication has 9 references indexed in Scilit:
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