Phase formation and dissociation in the thin-film Pd/Al system
- 15 September 1987
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (6) , 2269-2274
- https://doi.org/10.1063/1.339482
Abstract
Phase formation has been investigated for thin films in the following systems: Al/Pd, Pd2Al/Al and Pd/PdAl/Al between 200 and 450 °C. The films were prepared by sequential evaporation and coevaporation, annealed under vacuum, and analyzed by Rutherford backscattering and x-ray diffraction. Pd2Al3 is the dominant growing phase in the initial stages of the reaction for these samples. Al is the dominant moving species during the formation of Pd2Al3.This publication has 9 references indexed in Scilit:
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