Direct ion beam deposition for thin film formation
- 1 June 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 92 (1) , 115-122
- https://doi.org/10.1016/0040-6090(82)90193-6
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Thin-film deposition using low-energy ion beams (4) Ion source modificationJournal of Vacuum Science and Technology, 1978
- Ion-beam plating using mass-analyzed ionsJournal of Applied Physics, 1977
- Thin-film deposition using low-energy ion beams (3) Mg+ ion-beam deposition and analysis of depositsJournal of Vacuum Science and Technology, 1977
- Thin-film deposition using low-energy ion beams (2) Pb+ ion-beam deposition and analysis of depositsJournal of Vacuum Science and Technology, 1977
- Germanium and Silicon Film Growth by Low-Energy Ion Beam DepositionJapanese Journal of Applied Physics, 1977
- Thin film deposition using low-energy ion beams. I. System specification and designJournal of Vacuum Science and Technology, 1976
- High Intensity, Low Energy Spread Ion Source for Chemical AcceleratorsReview of Scientific Instruments, 1969
- The colutron, a zero deflection isotope separatorNuclear Instruments and Methods, 1964