Interdiffusion of thin Cr and Au films deposited on silicon
- 1 October 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 38 (1) , 15-19
- https://doi.org/10.1016/0040-6090(76)90274-1
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Principles and applications of ion beam techniques for the analysis of solids and thin filmsThin Solid Films, 1973
- Diffusion measurements in thin films utilizing work function changes: Cr into AuJournal of Applied Physics, 1972
- Microanalysis of Materials by Backscattering SpectrometryScience, 1972
- Backscattering investigation of low-temperature migration of chromium through gold filmsApplied Physics Letters, 1972
- Growth Kinetics Observed in the Formation of Metal Silicides on SiliconApplied Physics Letters, 1972