Cobalt lattice diffusion in bulk cobalt disilicide
- 1 November 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 53, 180-185
- https://doi.org/10.1016/0169-4332(91)90260-q
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
- Diffusion of dopants in tungsten disilicide: effects of diffusion pathsApplied Surface Science, 1991
- Reactive diffusion in thin filmsApplied Surface Science, 1991
- Isotope separation and growth mechanisms of intermetallic phases: An investigation of nickel silicides by secondary ion mass spectrometryJournal of Applied Physics, 1990
- Boron Diffusion in Bulk Cobalt DisilicideMRS Proceedings, 1990
- Comparison between CoSi2 and TiSi2 as dopant source for shallow silicided junction formationApplied Surface Science, 1989
- The diffusion of elements implanted in films of cobalt disilicideJournal of Applied Physics, 1988
- Diffusion of Sb, Ga, Ge, and (As) in TiSi2Journal of Applied Physics, 1988
- Kinetics of formation of silicides: A reviewJournal of Materials Research, 1986
- Lateral growth of titanium silicide over a silicon dioxide layerJournal of Applied Physics, 1983
- Stress-enhanced diffusion in thin filmsPhilosophical Magazine, 1970