The effects of argon pressure on the properties of sputtered tantalum films
- 1 April 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 16 (1) , 1-25
- https://doi.org/10.1016/0040-6090(73)90154-5
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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