Modeling of oxide breakdown from gate charging during resist ashing
- 1 January 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 41 (10) , 1848-1855
- https://doi.org/10.1109/16.324598
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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