A CMOS process for VLSI instrumentation
- 31 December 1982
- journal article
- Published by Elsevier in Microelectronics Journal
- Vol. 13 (6) , 29-32
- https://doi.org/10.1016/s0026-2692(82)80135-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Fabrication process techniques for switched-capacitor filter circuitsMicroelectronics Journal, 1982
- Comparison of new technologies for VLSI: Possibilities and limitationsMicroelectronics Journal, 1981
- Silicon-gate n-well CMOS process by full ion-implantation technologyIEEE Transactions on Electron Devices, 1980
- A compatible NMOS, CMOS metal gate processIEEE Transactions on Electron Devices, 1978