Critical thickness determination of InAs, InP and GaP on GaAs by X-ray interference effect and transmission electron microscopy
- 31 August 1993
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 131 (3-4) , 465-469
- https://doi.org/10.1016/0022-0248(93)90197-5
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Reflection high-energy electron diffraction and optical measurements on the molecular-beam epitaxial growth of one and two monolayers of InAs on GaAsJournal of Applied Physics, 1992
- Strain induced 2D–3D growth mode transition in molecular beam epitaxy of InxGa1t-xAs on GaAs (001)Journal of Crystal Growth, 1991
- Atomic layer molecular beam epitaxy (Almbe) of III?V compounds: Growth modes and applicationsApplied Physics A, 1989
- X-ray interference in ultrathin epitaxial layers: A versatile method for the structural analysis of single quantum wells and heterointerfacesPhysical Review B, 1989
- Atomic layer molecular beam epitaxy growth of InAs on GaAs substratesApplied Physics A, 1989
- One-dimensional dislocations. I. Static theoryProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1949