Boron etch-stop in TMAH solutions
- 1 June 1996
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 54 (1-3) , 728-732
- https://doi.org/10.1016/s0924-4247(97)80047-7
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- TMAH/IPA anisotropic etching characteristicsSensors and Actuators A: Physical, 1993
- A study of the undercutting characteristics in the TMAH-IPA systemJournal of Micromechanics and Microengineering, 1992
- Anisotropic etching of silicon in TMAH solutionsSensors and Actuators A: Physical, 1992
- Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: II . Influence of DopantsJournal of the Electrochemical Society, 1990
- The Controlled Etching of Silicon in Catalyzed Ethylenediamine‐Pyrocatechol‐Water SolutionsJournal of the Electrochemical Society, 1979