Ion-implantation-induced fluorine agglomeration in tungsten disilicide prepared by low-pressure chemical vapour deposition
- 1 April 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 40-41, 595-598
- https://doi.org/10.1016/0168-583x(89)91054-9
Abstract
No abstract availableKeywords
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