Scattering exposure: a simplified model of electron back-scattering in the substrate-polymer film structure
- 14 May 1981
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 14 (5) , 907-912
- https://doi.org/10.1088/0022-3727/14/5/023
Abstract
An investigation of the back-scattering process in a substrate-polymer film structure has been undertaken. The results of experiments have been correlated with theoretical diffusion models. The influence of some parameters of the substrate, the electron-sensitive polymer film and the electron beam on the size of structures produced with electron beam lithography has been shown.Keywords
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