Effects of gate depletion and boron penetration on matching of deep submicron CMOS transistors
- 23 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- A Fully Analytical MOSFET Model Parameter Extraction ApproachPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2005
- 0.5 micron CMOS for high performance at 3.3 VPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- The effect of statistical dopant fluctuations on MOS device performancePublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Experimental study of threshold voltage fluctuation due to statistical variation of channel dopant number in MOSFET'sIEEE Transactions on Electron Devices, 1994
- Matching properties of MOS transistorsIEEE Journal of Solid-State Circuits, 1989