Properties of hydrogenated amorphous silicon carbide films prepared by plasma-enhanced chemical vapor deposition
- 1 October 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 177 (1-2) , 253-262
- https://doi.org/10.1016/0040-6090(89)90573-7
Abstract
No abstract availableKeywords
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