Preparation of Y–Ba–Cu–O Films by dc Sputtering
- 1 June 1988
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 27 (6R)
- https://doi.org/10.1143/jjap.27.1103
Abstract
Y–Ba–Cu–O films were prepared by dc diode sputtering. Films were not deposited on the substrates directly facing the target. Ba activated by electron bombardment seems to be responsible for this phenomenon. Application of a strong transverse magnetic field between the target and the substrate holder was effective to prepare films with uniform thickness.Keywords
This publication has 3 references indexed in Scilit:
- High Tc Superconductivity of rf-sputtered Er-Ba-Cu-O FilmsJapanese Journal of Applied Physics, 1987
- Preparation of Y-Ba-Cu-O Thin Films by Rf-Magnetron SputteringJapanese Journal of Applied Physics, 1987
- High-Tc Y-Ba-Cu-O Thin Films Prepared by Dual Magnetron SputteringJapanese Journal of Applied Physics, 1987