Progress in large area Selective Silicon Deposition for TFT/LCD Applications
- 1 January 1994
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Selective Deposition of Silicon by Mercury Sensitized Photochemical Vapor DepositionJapanese Journal of Applied Physics, 1993
- Enhanced mobility top-gate amorphous silicon thin-film transistor with selectively deposited source/drain contactsIEEE Electron Device Letters, 1992
- Selective epitaxial growth of silicon and some potential applicationsIBM Journal of Research and Development, 1990
- Low-temperature selective epitaxial growth of silicon at atmospheric pressureApplied Physics Letters, 1989
- Selective silicon epitaxial growth at 800 °C by ultralow-pressure chemical vapor deposition using SiH4 and SiH4/H2Journal of Applied Physics, 1989