Modification of tetrahedral amorphous carbon film by concurrent Ar ion bombardment during deposition
- 5 June 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 105 (1-2) , 91-96
- https://doi.org/10.1016/s0257-8972(98)00462-9
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Optical properties of tetrahedral amorphous carbon films determined by spectroscopic ellipsometryThin Solid Films, 1997
- Deposition of nitrogen doped tetrahedral amorphouscarbon (ta-C:N) films by ionbeam assisted filtered cathodic vacuum arcElectronics Letters, 1997
- Control of film properties during filtered arc depositionSurface and Coatings Technology, 1996
- Determining hybridization differences for amorphous carbon from the XPS C 1s envelopeApplied Surface Science, 1995
- Structural models of a-C and a-C:HDiamond and Related Materials, 1995
- Substantiation of subplantation model for diamondlike film growth by atomic force microscopyPhysical Review Letters, 1994
- Properties of filtered-ion-beam-deposited diamondlike carbon as a function of ion energyPhysical Review B, 1993
- Properties of diamond-like carbonSurface and Coatings Technology, 1992
- Compressive-stress-induced formation of thin-film tetrahedral amorphous carbonPhysical Review Letters, 1991
- Optical dispersion relations for amorphous semiconductors and amorphous dielectricsPhysical Review B, 1986