Deposition of copper oxide (Cu2O, CuO) thin films at high temperatures by plasma-enhanced CVD
- 1 December 1990
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 51 (6) , 486-490
- https://doi.org/10.1007/bf00324731
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Effect of the oxygen pressure during sputtering on the properties of thin CuOx filmsThin Solid Films, 1982
- Properties of reactively-sputtered copper oxide thin filmsThin Solid Films, 1979
- Electrical Conductivity of Single-Crystal Cuprous Oxide at High TemperaturesPhysical Review B, 1961
- Photoconductivity of Cuprous Oxide in Relation to Its Other Semiconducting PropertiesPhysical Review B, 1960