Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (3) , 1286-1292
- https://doi.org/10.1116/1.581275
Abstract
No abstract availableKeywords
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