Influence of excitation frequency on plasma parameters and etching characteristics of radio-frequency discharges
- 1 September 1999
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 116-119, 468-471
- https://doi.org/10.1016/s0257-8972(99)00111-5
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Innovative plasma diagnostics and control of process in reactive low-temperature plasmasSurface and Coatings Technology, 1998
- Plasma Diagnostics in rf Discharges Using Nonlinear and Resonance EffectsJapanese Journal of Applied Physics, 1997
- Nonlinearity of the radio-frequency sheathJournal of Applied Physics, 1996
- Very high-frequency capacitively coupled argon dischargesPlasma Sources Science and Technology, 1994
- Langmuir probe measurements of axial variation of plasma parameters in 27.1 MHz rf oxygen planar dischargesPlasma Chemistry and Plasma Processing, 1988