Low-temperature deposition of amorphous silicon solar cells
- 31 May 2001
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 68 (2) , 227-236
- https://doi.org/10.1016/s0927-0248(00)00249-x
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor depositionJournal of Applied Physics, 1999
- Wide band gap amorphous silicon thin films prepared by chemical annealingJournal of Applied Physics, 1999
- Optimization of High Efficiency Amorphous Silicon Alloy based Triple-Junction ModulesMRS Proceedings, 1999
- Flexible A-SI Based Solar Cells with Plastic Film SubstrateMRS Proceedings, 1999
- Influence of excitation frequency, temperature, and hydrogen dilution on the stability of plasma enhanced chemical vapor deposited a-Si:HJournal of Applied Physics, 1998
- Widegap a-Si:H films prepared at low substrate temperatureSolar Energy Materials and Solar Cells, 1997
- Device-quality wide-gap hydrogenated amorphous silicon films deposited by plasma chemical vapor deposition at low substrate temperatures.Journal of Applied Physics, 1991
- How to reach more precise interpretation of subgap absorption spectra in terms of deep defect density in a-Si:HJournal of Non-Crystalline Solids, 1991
- Properties of the SiH bond-stretching absorption band in a-Si:H grown by remote plasma enhanced CVD (RPECVD)Journal of Non-Crystalline Solids, 1987
- Optical characterization of amorphous silicon hydride filmsSolar Cells, 1980