Surface reactions during the a-Si : H growth in the diode and triode glow-discharge reactors
- 1 March 1991
- journal article
- Published by Elsevier in Surface Science
- Vol. 244 (1-2) , 22-38
- https://doi.org/10.1016/0039-6028(91)90166-p
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
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