Growth of γ-Al2O3 thin films on silicon by low pressure metal-organic chemical vapour deposition
- 1 May 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 213 (1) , 72-75
- https://doi.org/10.1016/0040-6090(92)90476-r
Abstract
No abstract availableFunding Information
- Ministry of Education
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