The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces
- 1 December 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (12A) , L2408
- https://doi.org/10.1143/jjap.29.l2408
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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